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ԣztиߵĸй`߷ֱȱcܶĥԺ坍̎ʹÉLc
a(chn)ƷVڰ댧w·оƬ·ܶ댧wԪ@ʾWИI(y)Ĥ桢ܶӡƾ·壨PCBИI(y)





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\WƷ˾2004һн(jng)OӋWĸ߿ƼI(y)˾(jng)^İl(f)չγ˼аl(f)OӋ졢ӹzMbۺյһwϵаWʴ_a(chn)O䣬ͨ^ʩƌWĹwϵ˾߂ѸٷЈa(chn)˾Ўʮ˽MɵOӋаl(f)Ϯa(chn)Ʒ(j)͑Ҫаl(f)®a(chn)ƷõĹWON͑OӋAˇ(ni)͑هҹ˾ڇ(ni)ЈкܸߵռʣhNWձn|ρЖ|^s@|ݸӋԺI(y)ЇӋƌWоԺ˜ʳߺI(y)ЇLC(sh)@g˾A|Aυ^(q)Șsu ˾ͨ^LcWxWCеOI(y)γϵлWa(chn)ƷYOӋܸ(j)͑ӆƸNʴ_W˾Įa(chn)Ʒ:R^ųߡyֳyУƬ˶壩ƽƽƽNRpRRRք塢_ͶӰ(sh)@aȮa(chn)Ʒнb䓻ɫĥɰпղNˇb ˾ʼKء|ǰÑ\ȡšּ\(ni)͑ṩĮa(chn)Ʒ͵ķգҚgӭѵ˾늻ǢՄI(y)yֹM(chung)x
Ia(chn)ƷԪӰyx,I(y)׃R^,˶,ֱʰ,Уʲy,ֳ,a,ֹRƬ,R,R,R,ƽƽ,ƽƽ,W_,ͶӰ,ZSyԇx ˾ݣ2010
˾W(wng)ַhttp://hcgxcy.glass.com.cn
^(q)V| |ݸ |ݸ
W(wng)ַ: http://hcgxcy.glass.com.cn
ztģ Photomask substratesa(chn)Ʒśr
Wǹ늼ga(chn)I(y)ĻAҪMɲe20o90ԺSWcϢƌW²ϿƌWIJںӻAϵĹWڹݔ⃦@ʾIđøͻwMɞϢǹϢgl(f)չĻAl֮һ(j)2013-2017ЇWИI(y)a(chn)NcͶYAy桷(sh)(j)@ʾS(ni)(jng)m(x)(wn)l(f)չЇWИI(y)l(f)չѸ͡(j)ҽy(tng)Ӌ֔(sh)(j)@ʾ2010꣬WИI(y)Ҏ(gu)ģI(y)(sh)_246ИI(y)ȫꌍF(xin)N234.05|ԪͬL53.70%;F(xin)15.37|ԪͬL87.10%;Ya(chn)Ҏ(gu)ģ_264.50|ԪͬL77.49%ڹWИI(y)ԇ(ni)N۞ΣCӰ^СИI(y)ȻF(xin)^õL^